Group III-nitride nanowires have attracted a lot of research interest in the past decade. They contain both the intrinsic properties of III-nitride materials and some unique properties induced by the nanowire structures. This article reviews the growth methods to obtain III-nitride nanowires, and discusses the pros and cons of both top-down and bottom-up approaches, with detailed discussions on different epitaxy methods. The most widely used catalyst-induced epitaxy and extrinsic particle free epitaxy to grow III-nitride nanowires are compared. The properties of those nanowires make them promising candidates for a broad range of applications, including optoelectronic, electronic and electromechanical devices, which are also presented, with a focus on the current challenges and recent progresses.
This review was submitted as part of the 2016 Materials Literature Review Prize of the Institute of Materials, Minerals and Mining run by the Editorial Board of MST. Sponsorship of the prize by TWI Ltd is gratefully acknowledged.
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