The aim of this work is to investigate the effect of titanium nitride coating for various treatment times (0.5–4 h) by cathodic cage plasma deposition (CCPD) on surface properties of AISI D6 tool steel. The obtained results depict micrometric-sized TiN film deposition under all processing condition with improved surface hardness and corrosion resistance. Raman and EDS analysis are used to calculate N/Ti ratios for stoichiometric calculations of samples. This study depicts that the surface properties of tool steel can be effectively improved by TiN film deposition using CCPD, with low processing time, low processing temperature and better uniformity, as compared to conventional techniques. Additionally, the problems associated with the conventional TiN films such as pores and voids are eliminated. This technique is compatible with industrial-scale applications, and thus results from this study are expected to be beneficial for the surface engineering industry.
SilvaALCE, MeiPR.Aços e Ligas Especiais. Editora Blucher São Paulo. 2006.
2.
MetalsV.Aços Ferramenta para Trabalho a Frio. catálogo técnico.
3.
BourithisL, PapadimitriouGD, SiderisJ.Comparison of wear properties of tool steels AISI D2 and O1 with the same hardness. Tribol Int. 2006;39(6):479–489. doi: 10.1016/j.triboint.2005.03.005
4.
YazdaniA, SoltaniehM, AghajaniH, A new method for deposition of nano sized titanium nitride on steels. Vac. 2011;86(2):131–139. doi: 10.1016/j.vacuum.2011.04.020
5.
RebenneHE, BhatDG.Review of CVD TiN coatings for wear-resistant applications: deposition processes, properties and performance. Surf Coat Technol. 1994;63(1):1–13. doi: 10.1016/S0257-8972(05)80002-7
6.
RichterF, KupferH, GiegengackH, Fundamental mechanisms of titanium nitride formation by d.c. magnetron sputtering. Surf Coat Technol. 1992;54-55:338–342. doi: 10.1016/0257-8972(92)90185-D
7.
HultmanL.Thermal stability of nitride thin films. Vacuum. 2000;57(1):1–30. doi: 10.1016/S0042-207X(00)00143-3
8.
TanC, ZhouK, KuangT, Novel performances of in situ plasma nitriding-PVD duplex-treated nanocrystalline TiN coatings. Surf Eng. 2018;34(7):520–526. doi: 10.1080/02670844.2017.1370881
9.
HiltonMR, VandentopGJ, SalmeronM, Tin coatings on M2 steel produced by plasma-assisted chemical vapor deposition. Thin Solid Films. 1987;154(1):377–386. doi: 10.1016/0040-6090(87)90380-4
10.
RawatRS, ChewWM, LeeP, Deposition of titanium nitride thin films on stainless steel—AISI 304 substrates using a plasma focus device. Surf Coat Technol. 2003;173(2-3):276–284. doi: 10.1016/S0257-8972(03)00628-5
11.
KrockenbergerY, KarimotoSI, YamamotoH, Coherent growth of superconducting TiN thin films by plasma enhanced molecular beam epitaxy. J Appl Phys. 2012;112(8):083920. doi: 10.1063/1.4759019
12.
RazaHA, ShafiqM, NaeemM, Cathodic cage plasma pre-treatment of TiN-coated AISI-304 stainless steel for enhancement of mechanical strength and wear resistance. J Mater Eng Perform. 2019;28(1):20–32. doi: 10.1007/s11665-018-3780-1
13.
CreusJ, MazilleH, IdrissiH.Porosity evaluation of protective coatings onto steel, through electrochemical techniques. Surf Coat Technol. 2000;130(2-3):224–232. doi: 10.1016/S0257-8972(99)00659-3
14.
AhnSH, YooJH, ChoiYS, Corrosion behavior of PVD-grown WC–(Ti1− xAlx) N films in a 3.5% NaCl solution. Surf Coat Technol. 2003;162(2-3):212–221. doi: 10.1016/S0257-8972(02)00519-4
15.
LiuC, LeylandA, BiQ, Corrosion resistance of multi-layered plasma-assisted physical vapour deposition TiN and CrN coatings. Surf Coat Technol. 2001;141(2-3):164–173. doi: 10.1016/S0257-8972(01)01267-1
16.
HussainT, AhmadR, KhanIA, Deposition of titanium nitride on Si(100) wafers using plasma focus. Nucl Instrum Methods Phys Res Sect B. 2009;267(5):768–772. doi: 10.1016/j.nimb.2009.01.008
17.
LieDYC, WangKL.Chapter 4 - SiGe/Si processing. In: WillardsonR, NalwaHS, editors. Semiconductors and semimetals Vol. 73. San Diego
: Elsevier; 2001. p. 151–197.
18.
LiC, BellT, DongH.A study of active screen plasma nitriding. Surf Eng. 2002;18(3):174–181. doi: 10.1179/026708401225005250
19.
GalloSC, DongH.On the fundamental mechanisms of active screen plasma nitriding. Vaccum. 2009;84(2):321–325. doi: 10.1016/j.vacuum.2009.07.002
20.
NayebpashaeeN, SoltaniehM, KheirandishS.A study on formation and growth mechanism of nitride layers during plasma nitriding process of plastic injection mold steel. Mater Manuf Processes. 2016;31(9):1192–1200. doi: 10.1080/10426914.2015.1019106
21.
BorthakurS, TalukdarN, NeogNK, Plasma surface interaction of nitrogen plasma on AISI 304 steel. Surf Eng. 2019: 1–10. doi:10.1080/02670844.2019.1631599.
22.
ChangS-H, LaiY-C, HuangK-T, Characteristics of DLC/oxynitriding duplex-treated V8 tool steel by DC-pulsed PECVD. Surf Eng. 2019: 1–8. doi:10.1080/02670844.2019.1635769.
23.
LinK, LiX, TianL, Active screen plasma surface co-alloying treatments of 316 stainless steel with nitrogen and silver for fuel cell bipolar plates. Surf Coat Technol. 2015;283:122–128. doi: 10.1016/j.surfcoat.2015.10.038
24.
DongY, LiX, TianL, Towards long-lasting antibacterial stainless steel surfaces by combining double glow plasma silvering with active screen plasma nitriding. Acta Biomater. 2011;7(1):447–457. doi: 10.1016/j.actbio.2010.08.009
25.
LinK, LiX, TianL, Active screen plasma surface co-alloying of 316 austenitic stainless steel with both nitrogen and niobium for the application of bipolar plates in proton exchange membrane fuel cells. Int J Hydrogen Energy. 2015;40(32):10281–10292. doi: 10.1016/j.ijhydene.2015.06.010
26.
DongY, LiX, BellT, Surface microstructure and antibacterial property of an active-screen plasma alloyed austenitic stainless steel surface with Cu and N. Biomed Mater. 2010;5(5):054105. doi: 10.1088/1748-6041/5/5/054105
27.
NaeemM, ShafiqM, Zaka-ul-IslamM, Improved surface properties of AISI-304 by novel duplex cathodic cage plasma nitriding. Mater Lett. 2017;189:213–216. doi: 10.1016/j.matlet.2016.12.016
28.
Natália de Freitas Daudt. Thin film. In: de Freitas DaudtN, BarbosaJCP, BrazDC, editors.Tin thin film deposition by cathodic cage discharge: effect of cage configuration and active species. Bristol
: IOP Publishing; 2012. p. 1.
29.
DaudtNDF, BarbosaJCP, MacêdoM, Effect of cage configuration in structural and optical properties of TiN films grown by cathodic cage discharge. Mater Res. 2013;16(4):766–771. doi: 10.1590/S1516-14392013005000065
30.
YanMF, ZhuYD, ZhangYX, Combining thermo-diffusing titanium and plasma nitriding to modify C61900 Cu-Al alloy. Vacuum. 2016;126:41–44. doi: 10.1016/j.vacuum.2016.01.015
31.
SowińskaA, CzarnowskaE, TarnowskiM, Structure and hemocompatibility of nanocrystalline titanium nitride produced under glow-discharge conditions. Appl Surf Sci. 2018;436:382–390. doi: 10.1016/j.apsusc.2017.12.028
32.
NishimotoA, NiiH, NaritaR, Simultaneous duplex process of TiN coating and nitriding by active screen plasma nitriding. Surf Coat Technol. 2013;228:S558–S562. doi: 10.1016/j.surfcoat.2012.04.021
33.
LopesRF, da CostaJAP, SilvaW, Tio2 anti-corrosive thin films on duplex stainless steel grown using cathodic cage plasma deposition. Surf Coat Technol. 2018;347:136–141. doi: 10.1016/j.surfcoat.2018.04.074
34.
SousaR, AraújoF, CostaT, Thin TiN and TiO2 film deposition in glass samples by cathodic cage. Mater Res. 2015;18(2):347–352. doi: 10.1590/1516-1439.313914
35.
de SousaRRM, SatoPS, VianaBC, Cathodic cage plasma deposition of TiN and TiO2 thin films on silicon substrates. J Vac Sci Technol A Vac Surf Films. 2015;33(4):041502. doi: 10.1116/1.4919770
36.
SousaRM, De AraújoFO, BarbosaJCP, Nitretação em gaiola catódica: influência do tempo de tratamento. Matéria (Rio de Janeiro). 2008;13:119–124. doi: 10.1590/S1517-70762008000100014
37.
RoquinyP, BodartF, TerwagneG.Colour control of titanium nitride coatings produced by reactive magnetron sputtering at temperature less than 100°C. Surf Coat Technol. 1999;116-119:278–283. doi: 10.1016/S0257-8972(99)00076-6
38.
SmithGB, Ben-DavidA, SwiftPD.A new type of TiN coating combining broad band visible transparency and solar control. Renew Energy. 2001;22(1-3):79–84. doi: 10.1016/S0960-1481(00)00071-9
39.
MontgomeryGPJr, KleinMV, GangulyBN, Raman scattering and far-infrared absorption induced by silver ions in sodium chloride. Phy Rev B. 1972;6(10):4047–4060. doi: 10.1103/PhysRevB.6.4047
40.
SpenglerW, KaiserR, ChristensenAN, Raman scattering, superconductivity, and phonon density of states of stoichiometric and nonstoichiometric TiN. Phy Rev B. 1978;17(3):1095–1101. doi: 10.1103/PhysRevB.17.1095
ConstableCP, YarwoodJ, MünzWD.Raman microscopic studies of PVD hard coatings. Surf Coat Technol. 1999;116–119:155–159. doi: 10.1016/S0257-8972(99)00072-9
43.
MüllerM, GeorgeC, D'AnnaB.Enhanced spectral analysis of C-TOF aerosol mass spectrometer data: iterative residual analysis and cumulative peak fitting. Int J Mass Spectrom. 2011;306(1):1–8. doi: 10.1016/j.ijms.2011.04.007
ChengYH, TayBK, LauSP, Substrate bias dependence of Raman spectra for TiN films deposited by filtered cathodic vacuum arc. J Appl Phys. 2002;92(4):1845–1849. doi: 10.1063/1.1491588
47.
SaeedA, KhanA, JanF, Validity of “sputtering and re-condensation” model in active screen cage plasma nitriding process. Appl Surf Sci. 2013;273:173–178. doi: 10.1016/j.apsusc.2013.02.008
48.
JeyachandranYL, NarayandassSK, MangalarajD, Properties of titanium nitride films prepared by direct current magnetron sputtering. Mater Sci Eng A. 2007;445-446:223–236. doi: 10.1016/j.msea.2006.09.021
49.
AhangaraniS, MahboubiF, SabourA.Effects of various nitriding parameters on active screen plasma nitriding behavior of a low-alloy steel. Vac. 2006;80(9):1032–1037. doi: 10.1016/j.vacuum.2006.01.013
