Growth of rutile TiO 2 thin films by laser ablation

Thin films of TiO₂ on glass substrates were grown by the laser ablation technique using the second harmonic (532 nm) of a pulsed Nd–YAG laser as the evaporation source. During deposition, various substrate temperatures and oxygen pressures were used to optimise the growth of rutile TiO₂ thin films. Raman spectroscopy and X-ray diffraction measurements showed that crystalline thin films were obtained at a substrate temperature as low as 100°C. The films show smooth surface morphology and good adhesion.