Deposition of ZrN x O y films by filtered cathodic vacuum arc

Zirconium oxynitride (ZrN_xO_y) thin films were prepared by filtered cathodic vacuum arc technique using N₂/O₂ mixtures. The effect of N₂/O₂ ratios on the microstructure, optical and mechanical properties of films had been investigated. X-ray diffraction results showed that o-Zr₃N₄(O) phase was observed at low oxygen flowrate, while tetragonal and monoclinic phases of ZrO₂ were detected at high one. Optical test revealed that the films changed from semitransparent to transparent, and the absorption edge shifted to lower wavelength with the increase in oxygen flowrate. The refractive indexes of films ranged from 2·24 to 3·47, and the optical band gap increased from 2·06 to 4 eV with the increasing oxygen content, which implied that the films had potentials in optoelectronic applications.