Time-of-Flight Secondary Ion Mass Spectroscopy with Bismuth Primary Ions of Clean and Air-Exposed Surfaces of Tellurium

Abstract

The regularity of Bi⁺, Bi³⁺ and Bi³⁺⁺ primary ions in the time-of-flight secondary ion mass spectroscopy fragment pattern of air oxidized Te and Bi⁺ direct-current scan cleaned Te is discussed. The most intensive fragments for a cleaned Te surface are positive and negative Te_x and BiTe_x clusters. The sequence of secondary ion cluster formation is Bi-Te alloying followed by sputtering and ionization. For oxidized Te the chemical composition of the produced Te_xO_y fragments satisfies the relation y = 2x for positive fragments and y = 2x + 1 for negative ones. Experimental findings are in a good agreement with the results predicted by Plog's model for TeO₂.

Keywords

Tex and BiTex clusters Plog's model tellurium dioxide

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