Abstract
Undoped and Mn-doped Co3O4 films were deposited on heated glasses substrates (TS = 400°C) using a homemade pneumatic spray method (PSM). The solution concentration and deposition time are 0.1 M and 4 min respectively. The effect of manganese doping concentration on structural, optical and electrical properties of cobalt oxide were investigated. The elaborated films were characterized by X-ray diffraction, UV-Vis spectroscopy, atomic force microscopy (AFM) the three-dimensional (3D), energy dispersive spectroscopy (EDS), and four points probe measurements. The XRD study showed that all films were polycrystalline consisting with spinel cubic phase orientated along to (111) plane. The lattice strain and crystallite size were estimated by Williamson-Hall method. The morphology of Mn-doped Co3O4 thin films shows a homogeneous surface with straight acicular nanorods (SANRs). EDS analysis showed the presence of peaks associated with Co, O and Mn elements which confirm the composition of the thin films. The optical band gaps varies from 1.42±0.07 to 1.47±0.07 eV of Egop1and Egop2 varies from 1.87±0.10 to 2.11±0.11 eV. In addition, the electrical measurement show a maximum electrical conductivity (σ= 15.54±0.78 (Ω.cm)-1) at 6% wt of Mn.
Keywords
Introduction
Absorbent conducting oxide (ACO) materials such as Fe2O3, Cu2O, NiO and Co3O4 have attracted a lot of research. The development of ACO are importance to their interesting optoelectronic, chemical optical and physical properties [1]. Among the ACO is cobalt oxide, which is one of the most remarkable material in experimental examination of scientific and technological importance [1]. Cobalt oxide has a three phases different crystalline are: Co2O3 (cubic structure), CoO (cubic structure) and Co3O4 (cubic spinel structure of the type AB2O4; where Co3 + ions occupy the octahedral sites and Co2+ occupy the tetrahedral sites) is high stability compared to other phases [2]. It has a high optical absorbance in the spectral range of UV-Vis and electrical conduction.
Co3O4 thin films suitable for many applications such as catalyst for gaz sensors [3] and catalysers[4, 5], super-capacitors [6], solar selective absorber due to the p-type semiconducting [7], energy storage [8], photocatalytic[9], etc. Co3O4 can be prodused by several techniques such as magnetron sputtering (MST), pulsed laser deposition (PLD), chemical vapor deposition (CVD), sol-gel process (SGP), reactive evaporation (RE), electrochemical deposition (ECD) and 400 °C molecular beam epitaxy (MBE). Previous studies indicate that doping of the transition metal elements (Fe, Mn, Cu, Cr, Ni) in Co3O4 can enhance electrocatalytic activity [10–14]. A. Lakehal et al. reported the optical absorption studies have shown they pure Co3O4 and Mn doped Co3O4 (9wt%) prepared by ultrasonic bath exhibits multiple band gap energies (Eg1 = 1.33 eV and Eg2 = 1.87 eV) for 45 min [7]. R. Venkatesha et al. have prepared Cu-doped Co3O4 films by nebulized spray pyrolysis method by varying the Cu dopant concentration, found band gap energie Eg2 = 1.72 eV of 6% Cu [15].
In this work, undoped and Mn-doped Co3O4 films are deposited using a homemade pneumatic spray method (PSM). The used technique has many advantages, such as it can produce homogeneous thin films with very regular crystallites sizes [16, 17]. It facilitates the control of the solution concentration, the control of temperature stabilization for glass substrates, the control of time for spraying, large-area spraying, and control of composition. In addition, the morphology of films can be controlled; therefore, it is one of the most important methods for the preparation of Co3O4 thin films. The effect of manganese doping on Co3O4 thin films crystallinity, transmittance, bandgap energy, and electrical conductivity of Co3O4 was investigated.
Experimental procedure
Mn-doped Co3O4 films thin films prepared using a simple homemade PSM on highly cleaning glass substrates. Cobalt chloride dehydrate (CoCl2.6H2O) with 0,1 M and manganese (II) chloride tetrahydrate (MnCl2.4H2O) were used as chemicals sources in the solvent which contained equal volumes of distilled water (H2O) with a volume of 50 ml too and two drops of chloride acid (HCl) also used as a stabilizer for the all samples in this work. Then use manganese doping with different PWM (Mn/Co = 0; 2; 4; 6; 8 and 10 weight %).The produced mixture was stirred for 1 h at temperature between 50 °C –60°C to yield a transparency and homogenous solutions. The glass substrates were cleaned using acetone and methanol solutions for 15 min respectively and rinsed by distilled water. The normalized distance of 20 cm between the spray nozzle (0,5 mm) and the substrates was maintained. The solution quantity of 50 ml was fixed during the preparation of thin films. The spray rate of 3 (ml/min) was maintained by using filtered compressed air (1bar) as a gas carrier. The deposition time was fixed to 4 min at 400 °C as substrate temperature for each film. The structural and crystalline properties of Mn-doped Co3O4 films were analyzed by X-Ray diffraction (Rigaku-Type MiniFlex600) with Cu K α radiation (λ= 0,1541874 nm) in the scanning range of (2θ) was between 10° and 80°.
The optical transmission of thin films was obtained at room temperature in the range of 300 –1000 nm by using a JASCO V-770 spectrophotometer. The morphological properties were studied using (KLA-Tencor Stylus P7) atomic force microscopy (AFM) with three-dimensional (3D). EDS, associated with SEM (TESCAN-VEGA3 scanning electron microscope) was used to determine the films chemical composition. As for electrical conductivity of thin films was measured by four probe points.
Results and discussions
Thin films thickness
The thickness (th) of Mn-doped Co3O4 thin films as a function of the PWM was calculated from UV-visible data using the following equation [18, 19].
Where, n is the refractive index at two adjacent maxima or minima at wavelengths λ1 and λ2. The variation of thickness shown in Fig. 1. It is clear that thickness is not a function of the proportion of manganese (WPM). This can be explained that manganese doping has no effect on the thickening of the thin films; this is due to the low percent of manganese (WPM).

VariationCo3O4 thin films thickness as a function of the WPM.
The XRD spectra of thin films of undoped and Mn-doped Co3O4 deposited at temperature of 400 ° C and 0.1 M as a solution concentration are shown in Fig. 2. It can be noted that all thin layers exhibit several diffraction peaks around 2θ= 19.01 °; 31.196 °; 36.834 °; 38. 482 ° and 59.393 ° which correspond respectively to the planes (111), (220), (311), (222) and (511). These peak reflections indicate the phase of Co3O4 according to (JCPDS 42-1467) [19]. The peaks position (θ values) were used to determine the d-spacing according to Bragg’s Iaw; λ = 2d * sinθ. The lattice parameter (a) of Co3O4 thin films as cubic system is determined from

DRX patterns of Co3O4: Mn thin films deposited by different PWM.
Structural parameters of Co3O4:Mn thin films
Mn-doped Co3O4 thin films are oriented preferentially along to the plane (111) in substrate temperature 400°C, Manickam et al. [20], Manogowri et al. [21], Louardi et al. [22], and Kouidri et al. [23] have obtained the same result for the Co3O4 thin films prepared by spray method. This direction has no diffraction relation with another oxide (CoO or Co2O3), this indicates that the thin films of Co3O4: Mn are more stable [24], and have minimum energy of the growth. The disappearance of the plane (220) and the decrease in the intensity of the plane (311) in the sample of 8% Mn may be due to the removal of crystal orientations with a preference for growth in the direction of the lowest energy, which is the plane (111).
This due to the increase of stress caused by the rise of Mn doping rate. However, good crystallization was obtained in the low doping. This is attributed to the increase in nucleation sites [25, 26].
The crystallite size (D) and lattice strain (ɛ), was analyzed using the williamson-hall method [26], being based on the following equation:
Where β: measured full width at half maximum (in radians), θ: Bragg angle (in degree), and λ: wavelength of X-rays.
Using the Williamson-Hall plot of Mn-doped Co3O4, the lattice strain and crystallite sizes were calculated respectively from the slope of the linear fit and y-intercept in Fig. 3. This analysis was applied to (111), (311), (222), and (511) corresponding peaks of the Co3O4:Mn thin films.

Williamson-Hall plots of Mn-doped Co3O4 for cubic spinel structure.
Table 2 shows the results obtained of W-H analysis for the cubic spinel phase. As can be seen, increasing the WPM(for⩽ 4% Mn) is accompanied with the crystallite sizes and lattice strain decrease (see Fig. 4). This results demonstrate that the substitution of Mn atom in cubic spinal lattice develops a lattice distortion and an intrinsic stress leading to the growth of smaller grains (up to 4 wt% Mn WPM) [27], a smiling correlation between the compressive strain and crystallite size has been reported by Mahdjoub et all in their study of ZnMgO thin films [7]. After this value, the crystallite sizes and lattice strain increased, and that is called coalescence step [28, 29].
Williamson-Hall XRD analysis of Mn-doped Co3O4 for cubic spinel structure

Lattice strain and crystallite size of Mn-doped Co3O4 from Williamson-Hall plots.

3DAFM images of Co3O4: Mn thin films with different WPM.
The morphological arrangement of the Mn-doped Co3O4 thin films deposited at 400°C with different weight percentage of manganese (WPM) was analyzed using atomic force microscopy(AFM) with three dimensional (3D)and is presented in Fig. 6. From AFM micrographs it is shown that the straight acicular nanorods (SANRs) is consistent with the results reported elsewhere [30], whereas, thin films of lower WPM, it shows fewer the SANR compared to the films witha higher WPM. A quantitative analysis of surface roughness upon small-scale image using the roughness function of the weigth percentage of Mn led to Rms values nm of 217 and 566 nm for lower WPM and higher WPM, respectively. The evolution of film surface as a function of the WPM as a function of the deposition rate can be explained as follows; at low percentage rat, this means that a few amounts of the Mn-doped Co3O4 have been deposited; therefore, fewer SANRs appear, so the surface is less rough. Increasing the WPM leads to an increase in the number of SANRs, and thus increased roughness.

EDS spectra of Mn-doped Co3O4 thin films with different WPM.
The chemical composition of elements present in the Mn-doped Co3O4 thin films was determined using EDS spectra with the scanning electron microscopy(SEM). Figure 6 shows the atomic percentages of elements present in the Mn-doped Co3O4. The oxygen and manganese density increases, but the cobalt density decreases in thin films. From the EDS spectra, from percentages for chemical compositions of the films obtained near to the stoichiometric in nature. Such surface morphology may offer expanded surface area, beneficial for gas sensing [15] and electrochromic applications [31].
Figure 7 shows the optical transmittance spectra of Mn-doped Co3O4 thin films deposited on glasses substrates at 400°C under a function of WPM. It can be seen, the Mn-doped Co3O4 thin films have exhibit a similar optical behavior over the wavelength of 300–2000 nm, but there is noticeable high transmittance of 16% for 6 WPM in the range visible (UV-Vis). The optical transmittance of the thin films deposited at low WPM values with a spinel phase was 5% because this thin films of spinel phase have low crystalline size (D = 24, 39 nm) which increasing light scattering. This leads to minimum transmittance in the films. These films are allowed to be use in solar cells and the PN junction [32–34].

Transmittance spectra of Co3O4: Mn thin films with different WPM.
The absorption edges correspond to the electronic excitation of the valence band at the conduction band. The direct band gap value is determined by the valence level related to the strong O2- (2p6) properties, and the conduction level at which the main contribution is given by the Co2+(3d7) orbital’s. The direct band gap value is determined by the valence level related to the strong Op properties, and the conduction level at which the main contribution is given by the Co orbitals. The presence of Co3 +(3d6) in Co3O4 gives rise to a sub-band located within the energy gap. So, that coincide with Egop1(is corresponds to the onset of O2-(2p) to the Co3 +(t2g)) excitation as highlighted in the enlarged (αhν)2 versus (hν) plots in the Fig. 8 and Egop2(is corresponds to the onset of O2-(2p) to the Co2+(t2g)), which determines the valence to conduction band excitation. The optical band gap Egop1 and Egop2 values for all samples are summarized in Table 3 with the WPM.

Plots of (αhυ)2 against hυ of Co3O4: Mn thin films with different WPM.
Optical and electrical parameters values of the deposited Mn-doped Co3O4 thin films
Co3O4 is known to possess strong photo absorption in the visible region, which is easily evidenced by its dark black color. To calculate the energy gap Egop associated with the incident photon energy (hν) and the absorption coefficient(α), we use the classical equation [24].
Where A is the proportionality constant and E gop is the band gap. Two linear regions appear indicating the existence of two different band gap values, which may be ascribed to the spin-orbit fragmenting of the valence band. The extrapolation of two straight lines to (αhυ) 2 = 0 (eV) 2 give values of the direct band gaps of Mn-doped Co3O4 thin films (see Table 3). It is found of Egop1 values of the energy band gap varies between 1.42 ± 0, 07 and 1.46 ± 0.07 eV while Egop2 values, which are obtained from the extrapolation of the first linear region, found to be varying between 1.873 ± 0.10 and 2.11 ± 0, 11eV (see Fig. 8). Increased film thickness could explain the increase in the optical band gap Egop2 and vice versa [35]. The marginal variation or shift observed in Egop2 values might be due to formation of impurity energy levels or localized energy states created between conduction band and valance band upon Mn doping. Co+3 substituted by Mn+3 leads to the formation of impurity energy levels created between CB band and VB band. This increase the amount of Co+3 vacancy. The observed marginal difference or decrease in the Egop2 values is also due to the presence of a high amount of acceptor states (cation vacancies) near the top edge of the range, which belong to Co3+ or Co2+(3dt2g). This can occur as a result of overlapping upper-edge states and donor-edge states upon doping of manganese observed from EDS, resulting in a narrowing of the range of Egop2 [3, 15]. After 6 wt% of Mn, the band gap energy increased; This can be explained by the increase in Urbach energies (see Fig. 9), that is, as the Urbach energy increases, the random energy increases, and thus the absence of crystal structural organization. The refractive index is related to optical band gap (Egop2) of a semiconductor by the following relationship [19, 36]:

Plots of (hυ) against lnα of Co3O4: Mn thin films with different WPM
The observed marginal difference or shift in the Egop2 values is further due to the formation of impurity energy levels or localized energy states created between the conduction domain and the straightness band upon doping of manganese observed from EDS [3, 15].
For measuring the sheet resistance (Rsheet) by the four-point probe technique, the current (I = 0.01μA) is applied between the outer two wires and the value of potential difference (V) is read across the two internal probes. Thus, the sheet resistance is calculated from the following relation:
The conductivity (σ) values of films are calculated from the following formula:
Where t h : is thickness of thin films.
The values of electrical conductivity (σ) of Mn-doped Co3O4 thin films are listed in Table 2. The variation of conductivity (σ) of thin films as a function of the WPMis illustrated in Figure 10. It can be observed that the conductivity (σ) increases with the increase of the WPM upto 6% Mn. After this value, the conductivity decreases. This increase is mainly due to an increase in the carrier concentration (holes) of the valence band due to electronic shifts in the conduction band and holes resulting from the non-stoichiometry of the oxygen network in the p-Co3O4 grain [37]. On the other hand, the reduction of the size of the grains and increasing of manganese gives rise to the appearance of the separate energy levels.

Electrical conductivity of Mn-doped Co3O4 thin films as a function of the WPM.
These levels manifest in the gap as electronic defects, which probably work like donors inducing the increase in conductivity. After the value of 6% Mn, the electrical conductivity (σ) decreases can be explained as follows; the increase in resistance is attributed to the reduced crystallization of thin films, resulting in a decrease in the electron scattering centers due to the increase of the WPM [38].
Undoped and Mn-doped Co3O4 thin films were deposited using a homemade pneumatic spray method (PSM) by varying manganese doping weight percentages (0, 2,4,6,8 and 10 wt %) on glass substrate at temperature 400°C. The X-ray diffraction patterns revealed that the crystalline quality of pristine and Mn-doped cobalt oxide (Co3O4) thin films self cubic spinel structure oriented along to (111) plane. The crystal size (D) and lattice strain (ɛ) were calculated based on X-ray diffraction and Williamson-Hall relationship. The morphology of pristine and Mn-doped Co3O4 thin films is almost homogeneous and with the forms straight acicular nanorods (SANRs).The optical studies showed tow direct band gaps Egop1 and Egop2 varied between 1,416±0,0708 to 1,466±0,0733 eV and from 1,873±0,0936 to 2,11±0,1055 eV respectively. The electrical conductivity increased get to 15, 536 ± 0, 7768 (Ω.cm)-1 with increasing percentages weight of Manganese doping (in 6 wt% of Mn) determined from four point probe technique. Co+3 substituted by Mn+3 leads to an increase in the amount of oxygen vacancy. The latter engenders the increase of electrical conductivity at 6% wt% of Mn.
It can be concluded, Manganese doping has a significant impact on the structural, morphological, optical, and electrical properties of Co3O4 thin films. Through the obtained results, it can be said that the pneumatic spray method (PSM) is important in obtaining homogeneous films with good structural, optical, and electrical properties. It can also be said that the Mn-doped cobalt oxide thin films prepared by the pneumatic spraying method (PSM) are applicable in photovoltaics, photocatalysis, and gas sensing applications.
