For use within the microelectronics industry, a pulsed helium–neon laser, in conjunction with a tape-controlled co-ordinate table, is employed as a fine machine tool for the generation of three main types of photolithographic mask. The main advantages of the system over the conventional method of mask production are its adaptability to computer control, the elimination of detailed artwork, and the ability to design and produce sets of masks within a few days of the initial requirement.
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